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·单波长抏反射膜
Substrate UV grade fused silica,BK7
Surface figure < λ/10@632.8nm
Surface quality 40-20
Chamfer 0.5mm, 45°
Coating material Electron beam deposited dielectric multi-layers
Incident angle
Clear aperture >85%
Laser-induced damage threshold >5J/cm2(1.06μm,1ns)
·宽带抏反射膜
Substrate UV grade fused silica,BK7
Surface figure < λ/10@632.8nm
Surface quality 40-20
Chamfer 0.5mm, 45°
Coating material Electron beam deposited dielectric multi-layers
Incident angle
Clear aperture >85%
·多波长抏反射膜
Substrate UV grade fused silica,BK7
Surface figure < λ/10@632.8nm
Surface quality 40-20
Chamfer 0.5mm, 45°
Coating material Electron beam deposited dielectric multi-layers
Incident angle
Clear aperture >85%
  波长、入射角和各种尺寸可按客户要求定制。

                  



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2002.6